Press Releases / In the News

18 December 2012

Alluxa announces a new line of ultra-flat dichroic and polychroic thin film filters that feature a flatness of less than 0.1wave RMS and transmission of greater than 95% without the need for backside compensation.

Alluxa, an emerging leader in next generation optical filters is pleased to announce the production of ultra-flat dichroic and polychroic filters with very high levels of in band transmission.

These filters are unique because they achieve flatness by eliminating the high stresses of as-deposited traditional ion-based coating process such as Ion Beam Sputtering (IBS) and Ion Assisted Deposition (IAD). Alluxa’s new technique uses a novel plasma hard coating process that produces low-loss, fully dense dielectric films with essentially net zero stress on the primary coated side. Because of this process, the films do not require the lengthy additional coating time of industry standard backside compensation or require the use of thick and expensive substrates. Typical uses for ultra-flat, thin dichroics are in imaging and laser based applications like confocal microscopy, DNA sequencing, and communications.

According to Peter Egerton, Alluxa’s VP Business Development, “The goal of Alluxa’s proprietary coating process is to deliver the highest levels of filter performance to our customers. This is a good example of our technology enabling higher performance, lower cost, or even both at the same time. This is particularly valuable in such a traditionally challenging product line.”

Ultra-flat, thin dichroic and polychroic filters are the latest product in Alluxa’s Ultra series of high performance filters. The Ultra line is intended to offer OEM customers and researchers higher performance than off the shelf products and commitment to tighter specification tolerances in order to provide the best possible system level performance.

A new whitepaper in Alluxa’s Learning Center introduces the “Ultra-flat, thin dichroic and polychroic” product line and gives guidance on the specification and usage of these filters.

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